High-performance CMOS variability in the 65-nm regime and beyond
IBM Journal of Research and Development - Advanced silicon technology
Modeling Process Variability in Scaled CMOS Technology
IEEE Design & Test
Statistical-Variability Compact-Modeling Strategies for BSIM4 and PSP
IEEE Design & Test
Capturing intrinsic parameter fluctuations using the PSP compact model
Proceedings of the Conference on Design, Automation and Test in Europe
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Statistical compact modeling (SCM) is necessary for variability aware design at nanometer regime. An extensive study has been carried out to evaluate the impact of the statistical parameter set selection on the statistical accuracy of two widely used industry standard compact models: BSIM4 and PSP. Different statistical parameter generation strategies have been employed to examine the impact of different statistical parameter selection on both device and circuit simulation accuracy.