A comment on “a fast parallel algorithm for thinning digital patterns”

  • Authors:
  • H. E. Lü;P. S. P. Wang

  • Affiliations:
  • National Taiwan Univ., Taipei, Taiwan;Northeastern Univ., Boston, MA

  • Venue:
  • Communications of the ACM - The MIT Press scientific computation series
  • Year:
  • 1986

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Abstract

A fast parallel thinning algorithm for digital patterns is presented. This algorithm is an improved version of the algorithms introduced by Zhang and Suen [5] and Stefanelli and Rosenfeld [3]. An experiment using an Apple II and an Epson printer was conducted. The results show that the improved algorithm overcomes some of the disadvantages found in [5] by preserving necessary and essential structures for certain patterns which should not be deleted and maintains very fast speed, from about 1.5 to 2.3 times faster than the four-step and two-step methods described in [3] although the resulting skeletons look basically the same.