Reliable and Efficient Pattern Matching Using an Affine Invariant Metric

  • Authors:
  • Michiel Hagedoorn;Remco C. Veltkamp

  • Affiliations:
  • Department of Computer Science, Utrecht University, Padualaan 14, 3584 CH Utrecht, The Netherlands. mh@cs.uu.nl;Department of Computer Science, Utrecht University, Padualaan 14, 3584 CH Utrecht, The Netherlands. Remco.Veltkamp@cs.uu.nl

  • Venue:
  • International Journal of Computer Vision
  • Year:
  • 1999

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Abstract

We present a new pattern similarity measurethat behaves well under affine transformations. Our similarity measure is useful for pattern matching since it is defined on patterns with multiple components,satisfies the metric properties, is invariant under affine transformations,and is robust with respect to perturbation and occlusion. We give an algorithm, based on hierarchical subdivisionof transformation space, which minimises our measureunder the group of affine transformations, given two patterns. In addition, we present results obtained using an implementation of this algorithm.