T3: Trends and Challenges in VLSI Technology Scaling towards 100nm

Authors:
S. Rusu;M. Sachdev;C. Svensson;B. Nauta
Affiliations:
Intel Corporation;University of Waterloo, Canada;Linkoping University, Sweden;University of Twente, The Netherlands
Venue:
ASP-DAC '02 Proceedings of the 2002 Asia and South Pacific Design Automation Conference
Year:
2002

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Abstract