A high speed and leakage-tolerant domino logic for high fan-in gates
GLSVLSI '05 Proceedings of the 15th ACM Great Lakes symposium on VLSI
FinFET domino logic with independent gate keepers
Microelectronics Journal
Impact of NBTI on performance of domino logic circuits in nano-scale CMOS
Microelectronics Journal
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In this paper, we discuss the design of leakage tolerant wide-OR domino gates for deep submicron (DSM), bulk CMOS technologies. Technology scaling is resulting in 3-5x increasein transistor IOFF/µm per generation resulting in 15%-30% noise margin degradation of high performance domino gates. We investigate several techniques that can improve the noise margin of domino logic gates and thereby ensure their reliable operation for sub-130nm technologies. Our simulations indicate that, selective usage of dual VTH transistors shows acceptable energy-delay tradeoffs for the 90nm technology. However, techniques like supply voltage (Vcc) reduction and using non-minimum Le transistors are required in order to ensure robust and scalable wide-OR domino designs for the 70nm generation.