The RF-CV method for characterization of leaky gate dielectrics
Microelectronic Engineering - Special issue: Proceedings of the 13th biennial conference on insulating films on semiconductors
Microelectronic Engineering - Proceedings of the 29th international conference on micro and nano engineering
Ge-channel p-MOSFETs with ZrO2 gate dielectrics
Microelectronic Engineering - The proceedings of the 2nd international symposium on nano- and giga-challenges in microelectronics
Improvement of interfacial properties with interfacial layer in La2O3/Ge structure
Microelectronic Engineering
Width-dependent statistical leakage modeling for random dopant induced threshold voltage shift
Proceedings of the 44th annual Design Automation Conference
Breakdown characteristics of nFETs in inversion with metal/HfO2 gate stacks
Microelectronic Engineering
Thermionic current losses due to quantum trapping in III-V superlattice solar cells
ICC'07 Proceedings of the 11th Conference on Proceedings of the 11th WSEAS International Conference on Circuits - Volume 11
I-V and C-V methods to extract Al/polysilicon Schottky diode parameters
MMACTE'05 Proceedings of the 7th WSEAS International Conference on Mathematical Methods and Computational Techniques In Electrical Engineering
Losses due to quantum size effects in thermionic currents in III-V MQW solar cells
ICC'05 Proceedings of the 9th International Conference on Circuits
Microelectronic Engineering
Net negative charge in low-temperature SiO2 gate dielectric layers
Microelectronic Engineering
ZnO as a dielectric for organic thin film transistor-based non-volatile memory
Microelectronic Engineering
Effect of rapid thermal annealing on deep level defects in the Si-doped GaN
Microelectronic Engineering
Cubic GaN/AlGaN Schottky-barrier devices on 3C-SiC substrates
Microelectronic Engineering
Effects of rapid thermal annealing on nitrided gate oxide grown on 4H-SiC
Microelectronic Engineering
Double-fin FETs based on standard CMOS approach
Microelectronic Engineering
Criticisms on and comparison of experimental channel backscattering extraction methods
Microelectronic Engineering
Recovering doping profiles in semiconductor devices with the Boltzmann-Poisson model
Journal of Computational Physics
III-V nMOSFETs - Some issues associated with roadmap worthiness (invited)
Microelectronic Engineering
PATMOS'05 Proceedings of the 15th international conference on Integrated Circuit and System Design: power and Timing Modeling, Optimization and Simulation
Temperature dependence of Al/Ti-based Ohmic contact to GaN devices: HEMT and MOSFET
Microelectronic Engineering
Underlying design advantages for GaN MOSFETs compared with GaN HFETs for power applications
Journal of Computational Electronics
Hi-index | 0.01 |