Variation

Authors:
Duane Boning;Karthik Balakrishnan;Hong Cai;Nigel Drego;Ali Farahanchi;Karen Gettings;Daihyun Lim;Ajay Somani;Hayden Taylor;Daniel Truque;Xiaolin Xie
Affiliations:
MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA;MIT, USA
Venue:
ISQED '07 Proceedings of the 8th International Symposium on Quality Electronic Design
Year:
2007

Citing 0
Cited 3

Silicon physical random functions

Proceedings of the 9th ACM conference on Computer and communications security
Variations, margins, and statistics

Proceedings of the 2008 international symposium on Physical design
Statistical modeling with the virtual source MOSFET model

Proceedings of the Conference on Design, Automation and Test in Europe

Quantified Score

Hi-index	0.00

Visualization

Abstract

Variation afflicts the design, manufacture, and operation of integrated circuits. Statistical metrology seeks to characterize and model variations and their sources, particularly through new variation test circuits. Advanced process control attempts to reduce process variation through sensing and control during fabrication. Design for manufacturability seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. Tools and techniques are needed in all of these areas; improvements in and increased linkage between statistical metrology and DFM will be particularly important and empowering.