Test Considerations for Gate Oxide Shorts in CMOS ICs

  • Authors:
  • Jerry Soden;Charles Hawkins

  • Affiliations:
  • Sandia National Laboratories;University of New Mexico

  • Venue:
  • IEEE Design & Test
  • Year:
  • 1986

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Abstract

Gate oxide shorts are defects that must be detected to produce high-reliability ICs. These problems will continue as devicesare scaled down and oxide thicknesses are reduced to the 100-? range. Complete detection of gate oxide shorts and other CMOSfailure mechanisms requires measuring the IDD current during the quiescent state after each test vector is applied to theIC. A 100-percent stuck-at fault test set is effective only if each test vector is accompanied by an IDD measurement. Thisarticle examines the need for a fast, sensitive method of measuring IDD during each test vector and discusses problems confrontingCMOS IC designers, test engineers and test instrumentation designers as they work to meet these demands.