A rapid modeling technique for measurable improvements in factory performance
Proceedings of the 30th conference on Winter simulation
Proceedings of the 31st conference on Winter simulation: Simulation---a bridge to the future - Volume 1
Proceedings of the 33nd conference on Winter simulation
WSC '04 Proceedings of the 36th conference on Winter simulation
Single toolset modeling approaches in semiconductor manufacturing
Proceedings of the Winter Simulation Conference
| Hi-index | 0.00 |
Photolithography is generally regarded as the most constraining element in semiconductor manufacturing. This is primarily attributable to the high capital investment and extensive re-entrant flows throughout this section. Cycle time management in this area is crucial to balance the trade off between tool utilization and cycle time. In a low volume, high product mix fab the inclusion of tool capabilities, and their status, can significantly affect tool utilization and overall cycle times. In this paper a simulation model is developed to aid cycle time decision making policies in the photolithography section of a low volume, high product mix fab. The objective of the study is to determine the optimum course of action, for varying levels of expected increased demand, while maintaining acceptable cycle times and minimizing total capital spent in photolithography. The actions reviewed include the increased use of capabilities where available, followed by the purchase of new photolithography equipment.