Layout optimization by pattern modification

  • Authors:
  • Ramin Hojati

  • Affiliations:
  • Cadence Design Systems, Inc., 555 River Oaks Parkway, San Jose, California

  • Venue:
  • DAC '90 Proceedings of the 27th ACM/IEEE Design Automation Conference
  • Year:
  • 1991

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Abstract

This paper introduces a new and practical approach to several layout optimization problems. A novel two-dimensional pattern generator, in connection with a set of routing and placement transformations, is employed to efficiently solve problems ranging from Wire Crossing Minimization and Topological Via Minimization to Minimum Steiner Tree Optimization and IO Alignment. The expected running time is O(nlogn) and the space requirement is O(n), where n is the number of layout objects. The system is fully coded and tested, and excellent results in both laboratory and real-life examples have been achieved.