Complete nanowire crossbar framework optimized for the multi-spacer patterning technique

Authors:
M. Haykel Ben-Jamaa;Gianfranco Cerofolini;Yusuf Leblebici;Giovanni De Micheli
Affiliations:
EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland;University of Milano-Bicocca, Milan, Italy;EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland;EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland
Venue:
CASES '09 Proceedings of the 2009 international conference on Compilers, architecture, and synthesis for embedded systems
Year:
2009

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Abstract

Nanowire crossbar circuits are an emerging architectural paradigm that promises a higher integration density and an improved fault-tolerance due to its reconfigurability. In this paper, we propose for the first time the utilization of the multi-spacer patterning technique to fabricate nanowire crossbars with a high cross-point density up to 1010 cm(-2). We propose a novel decoder fabrication method that can be included in a process dedicated to the multi-spacer patterning technique. We address the technology problems consisting in the variability and fabrication complexity at the design level by optimizing the encoding scheme. We show an overall reduction of the variability by 18% and a cancelation of the fabrication complexity overhead.