Ordered depth-first layouts for ray tracing

Authors:
Jae-Ho Nah;Jeong-Soo Park;Jin-Woo Kim;Chanmin Park;Tack-Don Han
Affiliations:
Yonsei University, Korea;Yonsei University, Korea;Yonsei University, Korea;Samsung Electronics, Korea;Yonsei University, Korea
Venue:
ACM SIGGRAPH ASIA 2010 Sketches
Year:
2010

Citing 3
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Abstract

We present an ordered depth-first tree layout for ray tracing. Among two child nodes, a child node with the larger surface area is stored next to its parent node. Hence, the probabilities that a ray accesses to the same cache line increase. Our approach can be easily and widely used for various ray tracing systems with very small overheads, as it is based on existing depth-first layouts.