A drain-current model for DG PMOSFETs with fabricated 35 nm device comparison
International Journal of Computational Science and Engineering
ICCS '07 Proceedings of the 7th international conference on Computational Science, Part IV: ICCS 2007
Design and performance analysis of double-gate MOSFET over single-gate MOSFET for RF switch
Microelectronics Journal
Design and performance analysis of cylindrical surrounding double-gate MOSFET for RF switch
Microelectronics Journal
Microelectronic Engineering
ISPA'06 Proceedings of the 2006 international conference on Frontiers of High Performance Computing and Networking
Mathematical and Computer Modelling: An International Journal
Effect of gate engineering in double-gate MOSFETs for analog/RF applications
Microelectronics Journal
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We explore the structure effect on electrical characteristics of sub-10-nm double-gate metal–oxide–semiconductor field-effect transistors (DG MOSFETs). To quantitatively assess the nanoscale DG MOSFETs' characteristics, the on/off current ratio, subthreshold swing, threshold voltage$( V_ th)$, and drain-induced barrier-height lowering are numerically calculated for the device with different channel length ($L$) and the thickness of silicon film$( T_ si)$. Based on our two-dimensional density gradient simulation, it is found that, to maintain optimal device characteristics and suppress short channel effects (SCEs) for nanoscale DG MOSFETs,$ T_ si$should be simultaneously scaled down with respect to$L$. From a practical fabrication point-of-view, a DG MOSFET with ultrathin$ T_ si$will suppress the SCE, but suffers the fabrication process and on-state current issues. Simulation results suggest that$ L/ T_ si geq 1$may provide a good alternative in eliminating SCEs of double-gate-based nanodevices.