Improving cluster tools performance using colored Petri nets in semiconductor manifacturing

  • Authors:
  • DongJin Kim;Emrah Cimren;Robert Havey;Abbas K. Zaidi

  • Affiliations:
  • Micron Technology Inc., Manassas, VA;Micron Technology Inc., Manassas, VA;Micron Technology Inc., Manassas, VA;George Mason University, Fairfax, VA

  • Venue:
  • Proceedings of the Winter Simulation Conference
  • Year:
  • 2012

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Abstract

Semiconductor manufacturing is a capital-extensive industry. How to utilize billions of dollars of equipment as efficiently as possible is a critical factor for a semiconductor manufacturer to succeed in stiff competition. Improving performance of manufacturing process increases overall tool throughput, reduces operating costs, and saves companies millions of dollars. In this study, we develop a methodology to analyze and improve a cluster tool's performance. A Colored Petri Net model is developed to determine internal bottleneck resource of the tool. Results conclude that the methodology improves tool efficiency and provides significant cost savings.