Layout decomposition for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Optimal layout decomposition for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
A novel layout decomposition algorithm for triple patterning lithography
Proceedings of the 49th Annual Design Automation Conference
E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Layout small-angle rotation and shift for EUV defect mitigation
Proceedings of the International Conference on Computer-Aided Design
An efficient layout decomposition approach for triple patterning lithography
Proceedings of the 50th Annual Design Automation Conference
E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system
Proceedings of the 50th Annual Design Automation Conference
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Character projection is a key technology to enhance throughput of e-beam lithography, in which characters need to be selected and placed on the stencil. This paper solves the problem of planning for overlapping-aware row-structure stencil, and also considers multi-column cell system for further throughput improvement. We propose an integrated framework to solve the subproblems of character selection, row distribution, single-row ordering and inter-row swapping efficiently. Experiments show that our approach outperforms the existing methods on all the benchmarks. We can achieve significant throughput improvement and up to 1782X speedup comparing with previous works. The average speedup is 704X.