Knapsack problems: algorithms and computer implementations
Knapsack problems: algorithms and computer implementations
Recent directions in netlist partitioning: a survey
Integration, the VLSI Journal
Multidimensional binary search trees used for associative searching
Communications of the ACM
FOCS '96 Proceedings of the 37th Annual Symposium on Foundations of Computer Science
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
E-beam lithography stencil planning and optimization with overlapped characters
Proceedings of the 2011 international symposium on Physical design
Layout decomposition for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
VLSI module placement based on rectangle-packing by the sequence-pair
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Dealing with IC manufacturability in extreme scaling
Proceedings of the International Conference on Computer-Aided Design
Proceedings of the 2014 on International symposium on physical design
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Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is integrated with several novel speedup techniques, i.e., successive relaxation, dynamic programming and KD-Tree based clustering, to achieve a good performance in terms of runtime and solution quality. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.