Pattern sensitive placement for manufacturability
Proceedings of the 2007 international symposium on Physical design
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Overlay aware interconnect and timing variation modeling for double patterning technology
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning technology friendly detailed routing
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Proceedings of the 2009 Asia and South Pacific Design Automation Conference
Double patterning layout decomposition for simultaneous conflict and stitch minimization
Proceedings of the 2009 international symposium on Physical design
Predicting variability in nanoscale lithography processes
Proceedings of the 46th Annual Design Automation Conference
Simultaneous layout migration and decomposition for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
Total sensitivity based dfm optimization of standard library cells
Proceedings of the 19th international symposium on Physical design
A matching based decomposer for double patterning lithography
Proceedings of the 19th international symposium on Physical design
Double patterning lithography aware gridless detailed routing with innovative conflict graph
Proceedings of the 47th Design Automation Conference
Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography
Proceedings of the 47th Design Automation Conference
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
High performance lithographic hotspot detection using hierarchically refined machine learning
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Rapid layout pattern classification
Proceedings of the 16th Asia and South Pacific Design Automation Conference
E-beam lithography stencil planning and optimization with overlapped characters
Proceedings of the 2011 international symposium on Physical design
Self-aligned double patterning decomposition for overlay minimization and hot spot detection
Proceedings of the 48th Design Automation Conference
Flexible 2D layout decomposition framework for spacer-type double pattering lithography
Proceedings of the 48th Design Automation Conference
Layout decomposition for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Optimal layout decomposition for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
DOPPLER: DPL-aware and OPC-friendly gridless detailed routing with mask density balancing
Proceedings of the International Conference on Computer-Aided Design
WISDOM: wire spreading enhanced decomposition of masks in double patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Native-conflict-aware wire perturbation for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
Graph-based subfield scheduling for electron-beam photomask fabrication
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
A polynomial time exact algorithm for self-aligned double patterning layout decomposition
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
Flexible self-aligned double patterning aware detailed routing with prescribed layout planning
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
Proceedings of the 49th Annual Design Automation Conference
Accurate process-hotspot detection using critical design rule extraction
Proceedings of the 49th Annual Design Automation Conference
Improved tangent space based distance metric for accurate lithographic hotspot classification
Proceedings of the 49th Annual Design Automation Conference
Simultaneous flare level and flare variation minimization with dummification in EUVL
Proceedings of the 49th Annual Design Automation Conference
A novel layout decomposition algorithm for triple patterning lithography
Proceedings of the 49th Annual Design Automation Conference
E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
TRIAD: a triple patterning lithography aware detailed router
Proceedings of the International Conference on Computer-Aided Design
E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system
Proceedings of the 50th Annual Design Automation Conference
Self-aligned double patterning aware pin access and standard cell layout co-optimization
Proceedings of the 2014 on International symposium on physical design
A high-performance triple patterning layout decomposer with balanced density
Proceedings of the International Conference on Computer-Aided Design
Methodology for standard cell compliance and detailed placement for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
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As the CMOS feature enters the era of extreme scaling (14nm, 11nm and beyond), manufacturability challenges are exacerbated. The nanopatterning through the 193nm lithography is being pushed to its limit, through double/triple or more general multiple patterning, while non-conventional lithography technologies such as extreme ultra-violet (EUV), e-beam direct-write (EBDW), and so on, still have grand challenges to be solved for their adoption into IC volume production. This tutorial will provide an overview of key overarching issues in nanometer IC design for manufacturability (DFM) with these emerging lithography technologies, from modeling, mask synthesis, to physical design and beyond.