Estimating the Support of a High-Dimensional Distribution
Neural Computation
Neural Computation
Process variation aware OPC with variational lithography modeling
Proceedings of the 43rd annual Design Automation Conference
Predictive models and CAD methodology for pattern dependent variability
Proceedings of the 2008 Asia and South Pacific Design Automation Conference
Proceedings of the 45th annual Design Automation Conference
Support vector machines for histogram-based image classification
IEEE Transactions on Neural Networks
High performance lithographic hotspot detection using hierarchically refined machine learning
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Rapid layout pattern classification
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Proceedings of the 48th Design Automation Conference
Dealing with IC manufacturability in extreme scaling
Proceedings of the International Conference on Computer-Aided Design
Data mining in design and test processes: basic principles and promises
Proceedings of the 2013 ACM international symposium on International symposium on physical design
A novel fuzzy matching model for lithography hotspot detection
Proceedings of the 50th Annual Design Automation Conference
Hi-index | 0.00 |
As lithography process nodes shrink to sub-wavelength levels generating acceptable layout patterns becomes a challenging problem. Traditionally, complex convolution based lithography simulations are used to estimate areas of high variability. These methods are slow and infeasible for large scale full chip analysis. This work proposes a solution to this problem by using machine learning techniques to identify layout areas that are more prone to variability. A novel target layout representation is proposed, and the latest support vector machine (SVM) algorithms are used to detect variability within standard cells and between cells in a simulated full chip layout.