A novel fuzzy matching model for lithography hotspot detection

Authors:
Sheng-Yuan Lin;Jing-Yi Chen;Jin-Cheng Li;Wan-yu Wen;Shih-Chieh Chang
Affiliations:
National Tsing Hua University, HsinChu, Taiwan, R.O.C.;National Tsing Hua University, HsinChu, Taiwan, R.O.C.;National Tsing Hua University, HsinChu, Taiwan, R.O.C.;National Tsing Hua University, HsinChu, Taiwan, R.O.C.;National Tsing Hua University, HsinChu, Taiwan, R.O.C.
Venue:
Proceedings of the 50th Annual Design Automation Conference
Year:
2013

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Abstract

In advanced IC manufacturing, as the gap between lithography optical wavelength and feature size increases, it becomes challenging to detect problematic layout patterns called lithography hotspot. In this paper, we propose a novel fuzzy matching model which can dynamically tune appropriate fuzzy regions around known hotspots. Based on this model, we develop a fast algorithm for lithography hotspot detection with very low chances of false-alarm. Our results are very encouraging with under 0.56 CPU-hrs/mm2 runtime.