A technique for two-dimensional pattern matching
Communications of the ACM - Special issue: multiprocessing
Efficient string matching: an aid to bibliographic search
Communications of the ACM
Optical proximity correction (OPC): friendly maze routing
Proceedings of the 41st annual Design Automation Conference
RADAR: RET-aware detailed routing using fast lithography simulations
Proceedings of the 42nd annual Design Automation Conference
Efficient process-hotspot detection using range pattern matching
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
Proceedings of the 45th annual Design Automation Conference
An automatic optical-simulation-based lithography hotspot fix flow for post-route optimization
Proceedings of the 2009 international symposium on Physical design
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
An automatic optical simulation-based lithography hotspot fix flow for post-route optimization
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
High performance lithographic hotspot detection using hierarchically refined machine learning
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Accurate process-hotspot detection using critical design rule extraction
Proceedings of the 49th Annual Design Automation Conference
Proceedings of the 50th Annual Design Automation Conference
A novel fuzzy matching model for lithography hotspot detection
Proceedings of the 50th Annual Design Automation Conference
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This paper introduces the concept of via range patterns and incompletely specified range patterns to represent new types of process-hotspots. Via range patterns can represent process-hotspots containing vias that are a major source of lithography issues. An incompletely specified range pattern can accurately and succinctly represent a process-hotspot where any configuration of objects (that is unknown to the user apriori) can exist in some of its peripheral regions. These new types of range patterns cannot be accurately represented and/or detected using the concept of range patterns introduced in [7]. A new detection algorithm that can accurately detect these new types of patterns is also proposed. This is necessitated since the range pattern matching algorithm proposed earlier causes mismatches: it either misses true matches or reports false matches for these new kinds of patterns. Theoretical results show that the proposed algorithm prevents the incorrect mis-match issues, while experimental results on fab provided process-hotspots show the algorithm is computationally efficient and practical for use on real industrial designs.