Layout impact of resolution enhancement techniques: impediment or opportunity?
Proceedings of the 2003 international symposium on Physical design
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Semiconductors: a little light magic
IEEE Spectrum
Optical proximity correction (OPC): friendly maze routing
Proceedings of the 41st annual Design Automation Conference
RADAR: RET-aware detailed routing using fast lithography simulations
Proceedings of the 42nd annual Design Automation Conference
Maze routing with OPC consideration
Proceedings of the 2005 Asia and South Pacific Design Automation Conference
Efficient process-hotspot detection using range pattern matching
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
Transferring Optical Proximity Correction (OPC) Effect into Optical Mode
ISQED '07 Proceedings of the 8th International Symposium on Quality Electronic Design
Modeling litho-constrained design layout
Proceedings of the 44th annual Design Automation Conference
Accurate detection for process-hotspots with vias and incomplete specification
Proceedings of the 2007 IEEE/ACM international conference on Computer-aided design
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
Proceedings of the 45th annual Design Automation Conference
Predictive formulae for OPC with applications to lithography-friendly routing
Proceedings of the 45th annual Design Automation Conference
Multilevel Full-Chip Gridless Routing With Applications to Optical-Proximity Correction
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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In this paper, an optical simulation-based lithography hotspot fix guidance generator and an automatic hotspot fix flow are proposed. We develop our aerial image simulation engine by enhancing the traditional sum of coherence system method. Subject to the shape changes, a strong correlation between the aerial image intensity difference maps of pre-optical proximity correction (OPC) and post-OPC schemes is found. We collect near a litho hotspot in a pre-OPC layout some fix actions that are local shape changes to optimize the optical intensity. Then, fix guidances will be selected from the collected fix actions by a heuristic algorithm and input to a router for fixing the hotspot. We integrate the fix guidance generation method with a commercial lithography hotspot detection tool to create an automatic post-route optical-simulation-embedded local fix (OSELF) flow and test with industry 65 nm designs. Compared with the commercial flow that uses only local fix, our method has a 1.4×-1.9× fix rate, similar run time, no new design rule check violation, and negligible circuit timing impacts. We also combine our OSELF algorithm with a rip-up and reroute engine, and test on the same designs. Compared to the commercial tool that uses a hybrid (local fix plus reroute) fix flow, our combined flow runs 1.7×-2.9× faster with 45-55% circuit timing impact. Both flows achieve a 100% hotspot fix rate.