Applied Multivariate Statistics with SAS Software
Applied Multivariate Statistics with SAS Software
Layout impact of resolution enhancement techniques: impediment or opportunity?
Proceedings of the 2003 international symposium on Physical design
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Optical proximity correction (OPC): friendly maze routing
Proceedings of the 41st annual Design Automation Conference
RADAR: RET-aware detailed routing using fast lithography simulations
Proceedings of the 42nd annual Design Automation Conference
Maze routing with OPC consideration
Proceedings of the 2005 Asia and South Pacific Design Automation Conference
Multilevel full-chip gridless routing considering optical proximity correction
Proceedings of the 2005 Asia and South Pacific Design Automation Conference
Efficient process-hotspot detection using range pattern matching
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
MARS-a multilevel full-chip gridless routing system
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Multilevel Full-Chip Gridless Routing With Applications to Optical-Proximity Correction
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
An automatic optical-simulation-based lithography hotspot fix flow for post-route optimization
Proceedings of the 2009 international symposium on Physical design
VIFI-CMP: variability-tolerant chip-multiprocessors for throughput and power
Proceedings of the 19th ACM Great Lakes symposium on VLSI
Routing for manufacturability and reliability
IEEE Circuits and Systems Magazine
Predictive formulae for OPC with applications to lithography-friendly routing
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
An automatic optical simulation-based lithography hotspot fix flow for post-route optimization
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
High performance lithographic hotspot detection using hierarchically refined machine learning
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Proceedings of the 48th Design Automation Conference
Lithography-aware layout compaction
Proceedings of the great lakes symposium on VLSI
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Due to the sub-wavelength lithography, manufacturing sub-90 nm feature sizes require intensive use of resolution-enhancement techniques, among which optical proximity correction (OPC) is the most popular technique in industry. Considering the OPC effects during routing can significantly alleviate the cost of post-layout OPC operations. In this paper, we present an efficient, accurate, and economical analytical formula for intensity computation and develop the first modeling of post-layout OPC based on a quasi-inverse lithography technique. Extensive simulations with SPLAT, the golden lithography simulator in academia and industry, show that our intensity formula has high fidelity. Incorporating the OPC costs computed by the quasi-inverse lithography technique for our post-layout OPC modeling into a router, the router can be guided to maximize the effects of the correction. Compared with a rule-based OPC method, the experimental results show that our approach can achieve 14% and 16% reductions in the maximum and average layout distortions, respectively.