Reticle enhancement technology: implications and challenges for physical design
Proceedings of the 38th annual Design Automation Conference
Optical proximity correction (OPC): friendly maze routing
Proceedings of the 41st annual Design Automation Conference
Manufacturing-Aware Physical Design
Proceedings of the 2003 IEEE/ACM international conference on Computer-aided design
Physical CAD changes to incorporate design for lithography and manufacturability
Proceedings of the 2004 Asia and South Pacific Design Automation Conference
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
Proceedings of the 45th annual Design Automation Conference
Predictive formulae for OPC with applications to lithography-friendly routing
Proceedings of the 45th annual Design Automation Conference
An automatic optical-simulation-based lithography hotspot fix flow for post-route optimization
Proceedings of the 2009 international symposium on Physical design
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Routing for manufacturability and reliability
IEEE Circuits and Systems Magazine
Predictive formulae for OPC with applications to lithography-friendly routing
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
An automatic optical simulation-based lithography hotspot fix flow for post-route optimization
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
SAT based multi-net rip-up-and-reroute for manufacturing hotspot removal
Proceedings of the Conference on Design, Automation and Test in Europe
Proceedings of the 48th Design Automation Conference
Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling
Proceedings of the 2013 ACM international symposium on International symposium on physical design
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As the technology of manufacturing process continues to advance, the process variation becomes more and more serious in nanometer designs. Optical proximity correction (OPC) is employed to correct the process variation of the diffraction effect. To obtain the desired layout as early as possible, routers must have some changes to handle the optical effects to speed up the OPC time and to avoid the routing result that cannot be corrected by the OPC process. In this paper, we propose two practical OPC-aware maze routing problems and present how to enhance an existing maze routing algorithm to get an optimal algorithm for each problem. The experimental results are also given to demonstrate the effectiveness of these two enhanced algorithms.