Unifying Maximum Cut and Minimum Cut of a Planar Graph
IEEE Transactions on Computers
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning technology friendly detailed routing
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning layout decomposition for simultaneous conflict and stitch minimization
Proceedings of the 2009 international symposium on Physical design
Simultaneous layout migration and decomposition for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
GREMA: graph reduction based efficient mask assignment for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
A matching based decomposer for double patterning lithography
Proceedings of the 19th international symposium on Physical design
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
WISDOM: wire spreading enhanced decomposition of masks in double patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Native-conflict-aware wire perturbation for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
Proceedings of the 49th Annual Design Automation Conference
Dealing with IC manufacturability in extreme scaling
Proceedings of the International Conference on Computer-Aided Design
Role of design in multiple patterning: technology development, design enablement and process control
Proceedings of the Conference on Design, Automation and Test in Europe
An efficient layout decomposition approach for triple patterning lithography
Proceedings of the 50th Annual Design Automation Conference
Proceedings of the 2014 on International symposium on physical design
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Double patterning technology (DPT) is regarded as the most practical solution for the sub-22nm lithography technology. DPT decomposes a single layout into two masks and applies double exposure to print the shapes in the layout. DPT requires accurate overlay control. Thus, the primary objective in DPT decomposition is to minimize the number of stitches (overlay) between the shapes in the two masks. The problem of minimizing the number of stitches in DPT decomposition is conjectured to be NP-hard. Existing approaches either apply Integer Linear Programming (ILP) or use heuristics. In this paper, we show that the problem is actually in P and present a method to decompose a layout for DPT and minimize the number of stitches optimally. The complexity of the method is O(n1.5 log n). Experimental results show that the method is even faster than the fast heuristics.