Toward a methodology for manufacturability-driven design rule exploration
Proceedings of the 41st annual Design Automation Conference
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
Proceedings of the 45th annual Design Automation Conference
Double patterning layout decomposition for simultaneous conflict and stitch minimization
Proceedings of the 2009 international symposium on Physical design
GREMA: graph reduction based efficient mask assignment for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
Layout decomposition approaches for double patterning lithography
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems - Special issue on the 2009 ACM/IEEE international symposium on networks-on-chip
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
Optimal layout decomposition for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
A framework for double patterning-enabled design
Proceedings of the International Conference on Computer-Aided Design
WISDOM: wire spreading enhanced decomposition of masks in double patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Detailed Placement for Enhanced Control of Resist and Etch CDs
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Simultaneous Layout Migration and Decomposition for Double Patterning Technology
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
A methodology for the early exploration of design rules for multiple-patterning technologies
Proceedings of the International Conference on Computer-Aided Design
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Multiple-patterning optical lithography is inevitable for technology scaling beyond the 22nm technology node. Multiple patterning imposes several counter-intuitive restrictions on layout and carries serious challenges for design methodology. This paper examines the role of design at different stages of the development and adoption of multiple patterning: technology development, design enablement, and process control. We discuss how explicit design involvement can enable timely adoption of multi-patterning with reduced costs both in design and manufacturing.