A Simple 3-Edge-Connected Component Algorithm
Theory of Computing Systems
Depth-first search and linear grajh algorithms
SWAT '71 Proceedings of the 12th Annual Symposium on Switching and Automata Theory (swat 1971)
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning layout decomposition for simultaneous conflict and stitch minimization
Proceedings of the 2009 international symposium on Physical design
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
Layout decomposition for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Optimal layout decomposition for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
Proceedings of the 49th Annual Design Automation Conference
A novel layout decomposition algorithm for triple patterning lithography
Proceedings of the 49th Annual Design Automation Conference
A polynomial time triple patterning algorithm for cell based row-structure layout
Proceedings of the International Conference on Computer-Aided Design
Proceedings of the 2014 on International symposium on physical design
A high-performance triple patterning layout decomposer with balanced density
Proceedings of the International Conference on Computer-Aided Design
Constrained pattern assignment for standard cell based triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Methodology for standard cell compliance and detailed placement for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
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Triple Patterning Lithography (TPL) is widely recognized as a promising solution for 14/10nm technology node. In this paper, we propose an efficient layout decomposition approach for TPL, with the objective to minimize the number of conflicts and stitches. Based on our analysis of actual benchmarks, we found that the whole layout can be reduced into several types of small feature clusters, by some simplification methods, and the small clusters can be solved very efficiently. We also present a new stitch finding algorithm to find all possible legal stitch positions in TPL. Experimental results show that the proposed approach is very effective in practice, which can achieve significant reduction of manufacturing cost, compared to the previous work.