Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning layout decomposition for simultaneous conflict and stitch minimization
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Mask cost reduction with circuit performance consideration for self-aligned double patterning
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Layout decomposition for triple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
WISDOM: wire spreading enhanced decomposition of masks in double patterning lithography
Proceedings of the International Conference on Computer-Aided Design
A polynomial time exact algorithm for self-aligned double patterning layout decomposition
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
Proceedings of the 49th Annual Design Automation Conference
A novel layout decomposition algorithm for triple patterning lithography
Proceedings of the 49th Annual Design Automation Conference
E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Layout small-angle rotation and shift for EUV defect mitigation
Proceedings of the International Conference on Computer-Aided Design
A polynomial time triple patterning algorithm for cell based row-structure layout
Proceedings of the International Conference on Computer-Aided Design
An efficient layout decomposition approach for triple patterning lithography
Proceedings of the 50th Annual Design Automation Conference
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography
Proceedings of the 50th Annual Design Automation Conference
Proceedings of the International Conference on Computer-Aided Design
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Triple patterning lithography (TPL) has been recognized as one of the most promising candidates for 14/10nm technology node. Apart from obtaining legal TPL decompositions, various concerns have been raised by the designers, among them consistently assigning the same pattern for the same type of standard cells and balancing the usage of the three masks are two most critical ones. In this paper, a hybrid approach (SAT followed by a sliding-window approach) is proposed targeting at these two problems. To assign the same pattern for the same type of standard cell, we pre-color the boundary polygons of each type of cell by solving a small SAT problem. Following that we propose a sliding-window based approach to compute a locally balanced decomposition. Our algorithm guarantees to find a feasible solution if one exists. Experimental results verify that the problem can be solved very efficiently with the proposed algorithm. Superior locally balanced decompositions are achieved compared with the previous approach in [19].