R-trees: a dynamic index structure for spatial searching
SIGMOD '84 Proceedings of the 1984 ACM SIGMOD international conference on Management of data
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning technology friendly detailed routing
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning lithography friendly detailed routing with redundant via consideration
Proceedings of the 46th Annual Design Automation Conference
GREMA: graph reduction based efficient mask assignment for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
Self-aligned double patterning decomposition for overlay minimization and hot spot detection
Proceedings of the 48th Design Automation Conference
Flexible 2D layout decomposition framework for spacer-type double pattering lithography
Proceedings of the 48th Design Automation Conference
WISDOM: wire spreading enhanced decomposition of masks in double patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Native-conflict-aware wire perturbation for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
Dealing with IC manufacturability in extreme scaling
Proceedings of the International Conference on Computer-Aided Design
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography
Proceedings of the 50th Annual Design Automation Conference
Self-aligned double patterning aware pin access and standard cell layout co-optimization
Proceedings of the 2014 on International symposium on physical design
Proceedings of the International Conference on Computer-Aided Design
Proceedings of the 2014 on International symposium on physical design
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Self-aligned double patterning (SADP) is a promising manufacturing option for sub-22nm technology nodes. Studies have shown that SADP provides better overlay control than traditional litho-etch-litho-etch double patterning. However, the use of stitch is not allowed, which makes layout decomposition for SADP more difficult. It is necessary to find a new solution to handle pattern conflicts and consider SADP in earlier stages. In this paper, we propose a novel multi-layer SADP-aware detailed routing with prescribed layout planning. Our method is based on a correct-by-construction approach to take SADP compliancy into account during routing, and to achieve layout decomposition simultaneously. The experimental result shows that the proposed approach consistently achieves SADP-compliant solutions on both single-layer and multi-layer designs.