Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Flexible self-aligned double patterning aware detailed routing with prescribed layout planning
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
Exploring sub-20nm FinFET design with predictive technology models
Proceedings of the 49th Annual Design Automation Conference
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FinFETs have recently overtaken bulk CMOS transistors as the device of choice for systems-on-chip. This paper provides some background on FinFETs together with their associated manufacturing processes and shows how they influence physical design of standard cells as well as place & route and timing closure for larger blocks.