Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning layout decomposition for simultaneous conflict and stitch minimization
Proceedings of the 2009 international symposium on Physical design
Simultaneous layout migration and decomposition for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
GREMA: graph reduction based efficient mask assignment for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
A polynomial time exact algorithm for self-aligned double patterning layout decomposition
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
Flexible self-aligned double patterning aware detailed routing with prescribed layout planning
Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design
A polynomial time triple patterning algorithm for cell based row-structure layout
Proceedings of the International Conference on Computer-Aided Design
Dealing with IC manufacturability in extreme scaling
Proceedings of the International Conference on Computer-Aided Design
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography
Proceedings of the 50th Annual Design Automation Conference
Self-aligned double patterning aware pin access and standard cell layout co-optimization
Proceedings of the 2014 on International symposium on physical design
Proceedings of the International Conference on Computer-Aided Design
Design with FinFETs: design rules, patterns, and variability
Proceedings of the International Conference on Computer-Aided Design
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Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive runtimes.