VeriCDF: a new verification methodology for charged device failures

  • Authors:
  • Jaesik Lee;Ki-Wook Kim;Sung-Mo Kang

  • Affiliations:
  • University of Illinois, Urbana, IL;Pluris Incorporation, Cupertino, CA;University of California, Santa Cruz, CA

  • Venue:
  • Proceedings of the 39th annual Design Automation Conference
  • Year:
  • 2002

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Abstract

A novel tool for full-chip verification is reported for CDM-ESD protection. Until recently, ESD protection has been simulated in device level, leading to the well known limitations on capturing global features such as the power protection circuits and package parasitics. In practice, fatal failures occur due to unexpected discharged paths in multi-power supply chips, which can only be verified by chip-level simulation. Associated with the new concept of macromodelling, hierarchical approach provides effective analysis methodology for mixed-signal chips. The hierarchical approach provides the analysis of chip-level discharging paths and reliability of gate oxide. Simulation results on a CMOS ASIC chip processed in a 0.25-&mgr; technology are in accordance with the measurement data. Scanning electron microscope locates a gate oxide fault as our analysis predicted.