A compact DC model of gate Oxide short defect

  • Authors:
  • R. Bouchakour;J. M. Portal;J. M. Gallière;F. Azais;Y. Bertrand;M. Renovell

  • Affiliations:
  • L2MP, UMR CNRS 6137, IMT Technopole de Chateau Gombert, 13451 Marseille cedex 20, France;L2MP, UMR CNRS 6137, IMT Technopole de Chateau Gombert, 13451 Marseille cedex 20, France;LIRMM, UMII, 161 rue Ada, 34392 Montpellier, France;LIRMM, UMII, 161 rue Ada, 34392 Montpellier, France;LIRMM, UMII, 161 rue Ada, 34392 Montpellier, France;LIRMM, UMII, 161 rue Ada, 34392 Montpellier, France

  • Venue:
  • Microelectronic Engineering - Special issue: Proceedings of the 13th biennial conference on insulating films on semiconductors
  • Year:
  • 2004

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Abstract

In this paper a new electrical transistor compact model including a gate oxide short defects is proposed based on a charge sheet model approach. The basic equations and the topology of the model are presented in detail. It is demonstrated that the electrical behaviour of the proposed model matches in a satisfactory way the defective transistor behaviour.