TCAD development for lithography resolution enhancement

Authors:
L. W. Liebmann;S. M. Mansfield;A. K. Wong;M. A. Lavin;W. C. Leipold;T. G. Dunham
Affiliations:
IBM Microelectronics Division, Hopewell Junction, New York;-;Department of Electrical & Electronic Engineering, University of Hong Kong, Hong Kong;IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York;IBM Microelectronics Division, Essex Junction, Vermont;IBM Microelectronics Division, Essex Junction, Vermont
Venue:
IBM Journal of Research and Development
Year:
2001

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Abstract

This paper is an overview of work in the IBM Microelectronics Division to extend electron-beam lithography technology to the projection level for use in next-generation lithography. The approach being explored--Projection Reduction Exposure with Variable ...