Post-placement temperature reduction techniques

  • Authors:
  • Wei Liu;Alberto Nannarelli;Andrea Calimera;Enrico Macii;Massimo Poncino

  • Affiliations:
  • Technical University of Denmark, Denmark;Technical University of Denmark, Denmark;Politecnico di Torino, Torino, Italy;Politecnico di Torino, Torino, Italy;Politecnico di Torino, Torino, Italy

  • Venue:
  • Proceedings of the Conference on Design, Automation and Test in Europe
  • Year:
  • 2010

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Abstract

With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit's area.