Enhancing double-patterning detailed routing with lazy coloring and within-path conflict avoidance

Authors:
Xin Gao;Luca Macchiarulo
Affiliations:
University of Hawaii at Manoa, Honolulu, HI;University of Hawaii at Manoa, Honolulu, HI
Venue:
Proceedings of the Conference on Design, Automation and Test in Europe
Year:
2010

Citing 3
Cited 3

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Abstract

Double patterning technology (DPT) is emerging as the dominant technology to achieve the 32-nm node and beyond. Two challenges faced by DPT are layout decomposition and overlay error. To handle the challenges, some effort has been made to consider DPT during detailed routing. In this paper, we propose two enhancing techniques for DPT-friendly detailed routing: lazy color decision and last conflict segment recording. Experiments show that our techniques are able to reduce the number of stitches by 15~20% with 4% increase in running time.