A defect tolerant self-organizing nanoscale SIMD architecture
Proceedings of the 12th international conference on Architectural support for programming languages and operating systems
CMOL: Second life for silicon?
Microelectronics Journal
CMOS Control Enabled Single-Type FET NASIC
ISVLSI '08 Proceedings of the 2008 IEEE Computer Society Annual Symposium on VLSI
Combining 2-level logic families in grid-based nanoscale fabrics
NANOARCH '07 Proceedings of the 2007 IEEE International Symposium on Nanoscale Architectures
Heterogeneous Two-Level Logic and Its Density and Fault Tolerance Implications in Nanoscale Fabrics
IEEE Transactions on Nanotechnology
Variability in Nanoscale Fabrics: Bottom-up Integrated Analysis and Mitigation
ACM Journal on Emerging Technologies in Computing Systems (JETC)
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Reliable and scalable manufacturing of nanofabrics entails significant challenges. Scalable nanomanufacturing approaches that employ the use of lithographic masks in conjunction with nanofabrication based on self-assembly have been proposed. A bottom-up fabrication of nanoelectronic circuits is expected to be subject to various defects and identifying the types of defects that may occur during each step of a manufacturing pathway is essential in any attempt to achieve reliable manufacturing. The paper proposes a methodology for analyzing the sources of defects in a nano-manufacturing flow and estimating the resulting systematic yield loss. This methodology allows analyzing the impact of the fabrication process on the systematic yield. It integrates physical fabric considerations, manufacturing sequences and the resulting defect scenarios. This is in contrast to most current approaches that use conventional defect models and assume constant defect rates without analyzing the manufacturing pathway to determine the sources of defects and their probabilities (or rates). While the focus of the paper is on estimating the mask overlay-limited yield for the NASIC nano-fabric, the proposed approach can be easily adapted to suit other structured nano-fabrics.