Template-mask design methodology for double patterning technology

Authors:
Chin-Hsiung Hsu;Yao-Wen Chang;Sani Richard Nassif
Affiliations:
National Taiwan University, Taipei, Taiwan;National Taiwan University, Taipei, Taiwan;IBM, Austin, Texas
Venue:
Proceedings of the International Conference on Computer-Aided Design
Year:
2010

Citing 6
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Abstract

Double patterning technology (DPT) has recently gained much attention and is viewed as the most promising solution for the sub-32-nm node process. DPT decomposes a layout into two masks and applies double exposure patterning to increase the pitch size and thus printability. This paper proposes the first mask-sharing methodology for DPT, which can share masks among different designs, to reduce the number of costly masks for double patterning. The design methodology consists of two tasks: template-mask design and template-mask-aware routing. A graph matching-based algorithm is developed to design a flexible template mask that tries to accommodate as many design patterns as possible. We also present a template-mask-aware routing (TMR) algorithm, focusing on DPT-related issues to generate routing solutions that satisfy the constraints induced from double patterning and template masks. Experimental results show that our designed template mask is mask-saving, and our TMR can achieve conflict-free routing with 100% routability and save at least two masks for each circuit with reasonable wirelength and runtime overheads.