Optimal phase conflict removal for layout of dark field alternating phase shifting masks
ISPD '99 Proceedings of the 1999 international symposium on Physical design
New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
Proceedings of the 2001 Asia and South Pacific Design Automation Conference
IPRAIL: intellectual property reuse-based analog IC layout automation
Integration, the VLSI Journal - Special issue on analog and mixed-signal IC design and design methodologies
Lithography-aware layout compaction
Proceedings of the great lakes symposium on VLSI
| Hi-index | 0.00 |