Optimal phase conflict removal for layout of dark field alternating phase shifting masks

  • Authors:
  • Piotr Berman;Andrew B. Kahng;Devendra Vidhani;Huijuan Wang;Alex Zelikovsky

  • Affiliations:
  • Dept. of Computer Science and Engineering, Pennsylvania State University, University Park, PA;UCLA Dept. of Computer Science, Los Angeles, CA;UCLA Dept. of Computer Science, Los Angeles, CA;UCLA Dept. of Computer Science, Los Angeles, CA;Dept. of Computer Science, Georgia State University, University Plaza, Atlanta, GA

  • Venue:
  • ISPD '99 Proceedings of the 1999 international symposium on Physical design
  • Year:
  • 1999

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Abstract