Optimal phase conflict removal for layout of dark field alternating phase shifting masks
ISPD '99 Proceedings of the 1999 international symposium on Physical design
Subwavelength lithography and its potential impact on design and EDA
Proceedings of the 36th annual ACM/IEEE Design Automation Conference
Application of automated design migration to alternating phase shift mask design
Proceedings of the 2001 international symposium on Physical design
Algorithms for VLSI Physcial Design Automation
Algorithms for VLSI Physcial Design Automation
Layout impact of resolution enhancement techniques: impediment or opportunity?
Proceedings of the 2003 international symposium on Physical design
Advanced routing in changing technology landscape
Proceedings of the 2003 international symposium on Physical design
CAD computation for manufacturability: can we save VLSI technology from itself?
Proceedings of the 2002 IEEE/ACM international conference on Computer-aided design
An MILP-based wire spreading algorithm for PSM-aware layout modification
Proceedings of the 2008 Asia and South Pacific Design Automation Conference
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In this paper, we investigate routing restrictions that enable the generation of "correct by construction" layouts for Dark Field AltPSM. Existing routers produce designs in which coloring errors are numerous, and up to 15% of the pin locations in macros may cause unavoidable coloring errors. We identify routing restrictions which produce 100% phase-correct results, and quantify the impact on wire-lengths and via counts.