Subwavelength lithography and its potential impact on design and EDA

  • Authors:
  • Andrew B. Kahng;Y. C. Pati

  • Affiliations:
  • UCLA Department of Computer Science, Los Angeles, CA;Numerical Technologies, Inc., Santa Clara, CA

  • Venue:
  • Proceedings of the 36th annual ACM/IEEE Design Automation Conference
  • Year:
  • 1999

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Abstract