Application of automated design migration to alternating phase shift mask design

Authors:
Fook-Luen Heng;Lars Liebmann;Jennifer Lund
Affiliations:
IBM T.J. Watson Research Center, P.O. BOX 218, Yorktown Heights, NY;IBM Microelectronics, 2070 Route 52, Hopewell Junction, NY;IBM T.J. Watson Research Center, P.O. BOX 218, Yorktown Heights, NY
Venue:
Proceedings of the 2001 international symposium on Physical design
Year:
2001

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Abstract

The use of phase shifted mask (PSM) has been demonstrated to be a powerful resolution enhancement technique (RET) for the printing of features at dimensions below the exposure wavelength in deep submicron technologies. Its implementation in physical design has introduced non-conventional design ground rules, which impact the traditional layout migration process and designers productivity. In this panel discussion paper, we propose a solution to extend the traditional constraint-based layout migration and legalization approach. The solution has been demonstrated to be very effective in practice.