A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation

  • Authors:
  • Fook-Luen Heng;Zhan Chen;Gustavo E. Tellez

  • Affiliations:
  • IBM Corporation, 32-138, T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY;Dept. of ECE, Univ. of Massachusetts, Amherst, MA;IBM Corporation, 32-138, T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY

  • Venue:
  • Proceedings of the 1997 international symposium on Physical design
  • Year:
  • 1997

Quantified Score

Hi-index 0.00

Visualization

Abstract