Combinatorial optimization: algorithms and complexity
Combinatorial optimization: algorithms and complexity
A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation
Proceedings of the 1997 international symposium on Physical design
Minplex—a compactor that minimizes the bounding rectangle and individual rectangles in a layout
DAC '86 Proceedings of the 23rd ACM/IEEE Design Automation Conference
Application of automated design migration to alternating phase shift mask design
Proceedings of the 2001 international symposium on Physical design
Layout impact of resolution enhancement techniques: impediment or opportunity?
Proceedings of the 2003 international symposium on Physical design
A Fast Minimum Layout Perturbation Algorithm for Electromigration Reliability Enhancement
DFT '98 Proceedings of the 13th International Symposium on Defect and Fault-Tolerance in VLSI Systems
DAC '83 Proceedings of the 20th Design Automation Conference
Calligrapher: A New Layout Migration Engine Based on Geometric Closeness
ISQED '04 Proceedings of the 5th International Symposium on Quality Electronic Design
Manufacturing-Aware Physical Design
Proceedings of the 2003 IEEE/ACM international conference on Computer-aided design
Automatic process migration of datapath hard IP libraries
Proceedings of the 2004 Asia and South Pacific Design Automation Conference
Backend CAD flows for "restrictive design rules"
Proceedings of the 2004 IEEE/ACM International conference on Computer-aided design
Timing-driven cell layout de-compaction for yield optimization by critical area minimization
Proceedings of the conference on Design, automation and test in Europe: Proceedings
Technology migration techniques for simplified layouts with restrictive design rules
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
Practical method for obtaining a feasible integer solution in hierarchical layout optimization
Proceedings of the 2007 IEEE/ACM international conference on Computer-aided design
A framework for double patterning-enabled design
Proceedings of the International Conference on Computer-Aided Design
Automatic design rule correction in presence of multiple grids and track patterns
Proceedings of the 50th Annual Design Automation Conference
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Restrictive design rules (RDRs) have been introduced as a simplified layout optimization method to better enable resolution enhancement techniques in ultra-deep submicron designs (16). In this paper, we study the technology migration problem for designs with strong RET-driven layout restrictions, i.e., RDR constraints, which require devices (gates) to be placed on a coarse pitch and in a single orientation. In particular, we study the legalization problem with on-pitch constraints for devices with an objective of minimum layout perturbation. The problem can be formulated as an integer linear programming (ILP) problem with a set of stringent integer constraints, and it can be approximated as a mixed integer linear programming (MILP) problem. Instead of using an MILP solver to solve it, we propose a two-stage method --- first the target on-pitch positions for gates are computed and second the original problem is relaxed to a linear programming problem. Library cell layouts designed in a technology with conventional ground rules have been migrated successfully to a technology with RDRs using our approach.