Microlithography: Trends, Challenges, Solutions, and Their Impact on Design

Authors:
Alfred K. Wong
Affiliations:
University of Hong Kong
Venue:
IEEE Micro
Year:
2003

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Abstract

With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30-nm physical-gate-length era with optical lithography.