Critical area extraction of extra material soft faults

  • Authors:
  • G. A. Allan;A. J. Walton

  • Affiliations:
  • -;-

  • Venue:
  • DFT '95 Proceedings of the IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems
  • Year:
  • 1995

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Abstract

A method of extracting the extra material critical area of soft faults from an integrated circuit layout is presented. This has been implemented in the EYE tool allowing efficient extraction of the critical area from arbitrary mask layout. Results comparing defect sensitivity of a routing network modified to reduce defect sensitivity are reported. The application to defect related reliability is explored.