Design Automation for Deepsubmicron: Present and Future

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  • Affiliations:
  • Venue:
  • Proceedings of the conference on Design, automation and test in Europe
  • Year:
  • 2002

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Abstract

Advancing technology drives design technology andthus design automation (EDA). How to model interconnect, ho w to handle degradation of signal integrity and increasing power density are changing now, and have ledto integrating logic and layout synthesis. Agressive gatesizing to control timing has become part of any modernback-end. F rom 0:13µ and down, chips will be more susceptive to breakdown during fabrication (antenna effect)or to wear out over time (electromigration) and dealingwith these issues will require careful planning.More integration of fast and accurate analysis with acomplete design ow (chip planning, synthesis, placementand routing) will be needed, and still, advancing complexity will affect design and verification. Using hundredsof millions of devices effectively will be possible only byreusing pre-designed intellectual property (IP) effectivelyand by addressing system-level issues in EDA.In the long term only more radical changes willkeepus on Moore's track, changes that ultimately will haveus depart from the two+-dimensional confinement andlead to multiple active layers, and changes that will affectdeeply the face of EDA altogether.