Design Automation for Deepsubmicron: Present and Future
Proceedings of the conference on Design, automation and test in Europe
Proceedings of the 41st annual Design Automation Conference
Current-driven wire planning for electromigration avoidance in analog circuits
ASP-DAC '03 Proceedings of the 2003 Asia and South Pacific Design Automation Conference
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Emerging yield and reliability challenges in nanometer CMOS technologies
Proceedings of the conference on Design, automation and test in Europe
Electromigration for microarchitects
ACM Computing Surveys (CSUR)
Optimal wiring topology for electromigration avoidance considering multiple layers and obstacles
Proceedings of the 19th international symposium on Physical design
Reliability-Driven Power/Ground Routing for Analog ICs
ACM Transactions on Design Automation of Electronic Systems (TODAES)
Circuit reliability: from physics to architectures
Proceedings of the International Conference on Computer-Aided Design
Electromigration and its impact on physical design in future technologies
Proceedings of the 2013 ACM international symposium on International symposium on physical design
WiT: optimal wiring topology for electromigration avoidance
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
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Electromigration is increasingly relevant to the physical design of electronic circuits. It is caused by excessive current density stress in the interconnect. The ongoing reduction of circuit feature sizes has aggravated the problem over the last couple of years. It is therefore an important reliability issue to consider electromigration-related design parameters during physical design. In this talk, we give an introduction to the electromigration problem and its relationship to current density. We then present various physical design constraints that affect electromigration. Finally, we introduce components of an electromigration-aware physical design flow.