Analytical compensation of inter-reflection for pattern projection

  • Authors:
  • Yasuhiro Mukaigawa;Takayuki Kakinuma;Yuichi Ohta

  • Affiliations:
  • Osaka University, Osaka, Japan;University of Tsukuba, Ibaraki, Japan;University of Tsukuba, Ibaraki, Japan

  • Venue:
  • Proceedings of the ACM symposium on Virtual reality software and technology
  • Year:
  • 2006

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Abstract

If a pattern is projected onto a concave screen,the desired view cannot be correctly observed due to the influence of inter-reflections. This paper proposes a simple but effective technique for photometric compensation in consideration of inter-reflections. The compensation is accomplished by canceling inter-reflections estimated by the radiosity method. The significant advantage of our method is that iterative calculations are not necessary because it analytically solves the inverse problem of inter-reflections.