SRAM write-ability improvement with transient negative bit-line voltage

  • Authors:
  • Saibal Mukhopadhyay;Rahul M. Rao;Jae-Joon Kim;Ching-Te Chuang

  • Affiliations:
  • School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA;IBM T. J. Watson Research Center, Yorktown Heights, NY;IBM T. J. Watson Research Center, Yorktown Heights, NY;National Chiao Tung University, Hscinchu, Taiwan

  • Venue:
  • IEEE Transactions on Very Large Scale Integration (VLSI) Systems
  • Year:
  • 2011

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Abstract

Increasing variations in device parameters significantly degrades the write-ability of SRAM cells in deep sub-100 nm CMOS technology. In this paper, a transient negative bit-line voltage technique is presented to improve write-ability of SRAM cell. Capacitive coupling is used to generate a transient negative voltage at the low-going bit-line during Write operation without using any on-chip or off-chip negative voltage source. Statistical simulations in a 45-nm PD/SOI technology show a 103X reduction in the Write-failure probability with the proposed method.